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Journal articles
An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA
Abstract : The analysis of a metal-organic chemical vapor deposition (MOCVD) process is performed by combining computational fluid dynamics (CFD) simulations and experimental measurements. The analysis is applied to a vertical, cold-wall reactor, where aluminum coatings are grown from dimethylethylamine alane (DMEAA), under low-pressure conditions. A two-dimensional model, based on the finite-volume method, is developed to predict the thermal and hydrodynamic characteristics of the flow within the MOCVD reactor, and the simulation results are compared with experimental data. It is shown that the computational predictions of the growth rates are in fair agreement with the experimental measurements.
Cited literature [8 references]
https://hal.archives-ouvertes.fr/hal-00806220
Contributor : Open Archive Toulouse Archive Ouverte (oatao) <>
Submitted on : Friday, March 29, 2013 - 3:46:58 PM
Last modification on : Tuesday, January 14, 2020 - 1:08:02 PM
Document(s) archivé(s) le : Sunday, June 30, 2013 - 4:03:04 AM
Contributor : Open Archive Toulouse Archive Ouverte (oatao) <>
Submitted on : Friday, March 29, 2013 - 3:46:58 PM
Last modification on : Tuesday, January 14, 2020 - 1:08:02 PM
Document(s) archivé(s) le : Sunday, June 30, 2013 - 4:03:04 AM
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