Skip to Main content Skip to Navigation
Journal articles

An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA

Abstract : The analysis of a metal-organic chemical vapor deposition (MOCVD) process is performed by combining computational fluid dynamics (CFD) simulations and experimental measurements. The analysis is applied to a vertical, cold-wall reactor, where aluminum coatings are grown from dimethylethylamine alane (DMEAA), under low-pressure conditions. A two-dimensional model, based on the finite-volume method, is developed to predict the thermal and hydrodynamic characteristics of the flow within the MOCVD reactor, and the simulation results are compared with experimental data. It is shown that the computational predictions of the growth rates are in fair agreement with the experimental measurements.
Complete list of metadatas

Cited literature [8 references]  Display  Hide  Download

https://hal.archives-ouvertes.fr/hal-00806220
Contributor : Open Archive Toulouse Archive Ouverte (oatao) <>
Submitted on : Friday, March 29, 2013 - 3:46:58 PM
Last modification on : Tuesday, January 14, 2020 - 1:08:02 PM
Document(s) archivé(s) le : Sunday, June 30, 2013 - 4:03:04 AM

File

xenidou_2447.pdf
Files produced by the author(s)

Identifiers

Collections

Citation

Theodora C. Xenidou, Andreas. G. Boudouvis, Nicholas. C. Markatos, Diane Samélor, François Senocq, et al.. An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA. Surface and Coatings Technology, Elsevier, 2007, vol. 201, pp. 8868-8872. ⟨10.1016/j.surfcoat.2007.04.080⟩. ⟨hal-00806220⟩

Share

Metrics

Record views

150

Files downloads

252