M. Delmas, D. Poquillon, Y. Kihn, and C. Vahlas, Al???Pt MOCVD coatings for the protection of Ti6242 alloy against oxidation at elevated temperature, Surface and Coatings Technology, vol.200, issue.5-6, p.1413, 2005.
DOI : 10.1016/j.surfcoat.2005.08.028
URL : https://hal.archives-ouvertes.fr/hal-00474908

S. V. Patankar, Numerical Heat Transfer and Fluid Flow, 1980.

G. Luo, S. P. Vanka, and N. Glumac, Fluid flow and transport processes in a large area atmospheric pressure stagnation flow CVD reactor for deposition of thin films, International Journal of Heat and Mass Transfer, vol.47, issue.23, p.4979, 2004.
DOI : 10.1016/j.ijheatmasstransfer.2004.06.012

J. Yun, M. Park, and S. Rhee, Fourier transform infrared diagnostics of gas phase reactions in the metalorganic chemical vapor deposition of aluminum from dimethylethylamine alane, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.16, issue.2, p.419, 1998.
DOI : 10.1116/1.581040

C. Ltd, Phoenics code, Version 3, 2004.

T. C. Xenidou, A. G. Boudouvis, D. M. Tsamakis, and N. C. Markatos, An Experimentally Assisted Computational Analysis of Tin Oxide Deposition in a Cold-Wall APCVD Reactor, Journal of The Electrochemical Society, vol.151, issue.12, p.757, 2004.
DOI : 10.1149/1.1809592

E. R. Galea and N. C. Markatos, The mathematical modelling and computer simulation of fire development in aircraft, International Journal of Heat and Mass Transfer, vol.34, issue.1, p.181, 1991.
DOI : 10.1016/0017-9310(91)90185-H

W. L. Holstein, Thermal Diffusion in Metal-Organic Chemical Vapor Deposition, Journal of The Electrochemical Society, vol.135, issue.7, p.1788, 1988.
DOI : 10.1149/1.2096131