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Article Dans Une Revue IEEE Transactions on Electromagnetic Compatibility Année : 2015

Modeling Magnetic Near-Field Injection at Silicon Die Level

Résumé

Near-field injection at silicon die level is a promising application for various area such as the analyses of integrated circuit (IC) susceptibility to electromagnetic interferences and security for cryptographic applications. This paper presents a first attempt to simulate the voltage induced on integrated circuit interconnects by a magnetic field probe. The validation of the simulation results is based on near-field injection performed on a test chip containing various types of interconnects and on-chip voltage sensors.
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Dates et versions

hal-01225324 , version 1 (06-11-2015)

Identifiants

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Alexandre Boyer, Bertrand Vrignon, Manuel Cavarroc. Modeling Magnetic Near-Field Injection at Silicon Die Level. IEEE Transactions on Electromagnetic Compatibility, 2015, 58 (1), pp. 257-269. ⟨10.1109/TEMC.2015.2486041⟩. ⟨hal-01225324⟩
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