MICROSTRUCTURE OF BORON-DOPED SILICON LAYERS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

D Bielledaspet , F Mansourbahloui , A Martinez , Bernard Pieraggi , Mj David , B Demauduit , A Oustry , Robert Carles , Georges Landa (1) , François Ajustron , Annie Mazel , P Riboulet

1 Laboratoire Physique des Solides de Toulouse

no abstract

Domaines: Matière Condensée [cond-mat]

D Bielledaspet, F Mansourbahloui, A Martinez, Bernard Pieraggi, Mj David, et al.. MICROSTRUCTURE OF BORON-DOPED SILICON LAYERS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION. Thin Solid Films, 1987, 150 (1), pp.69-82. ⟨10.1016/0040-6090(87)90309-9⟩. ⟨hal-01481849⟩