Copper nanoparticles and organometallic chemical liquid deposition (OMCLD) for substrate metallization

Clément Barrière (1) , Gilles Alcaraz (1) , Olivier Margeat (2) , Pierre Fau (1) , Jean Baptiste Quoirin (3) , Christine Anceau (3) , Bruno Chaudret (1)

1 LCC - Laboratoire de chimie de coordination
2 CINaM - Centre Interdisciplinaire de Nanoscience de Marseille
3 STMicroelectronics

Domaines: Chimie

Clément Barrière, Gilles Alcaraz, Olivier Margeat, Pierre Fau, Jean Baptiste Quoirin, et al.. Copper nanoparticles and organometallic chemical liquid deposition (OMCLD) for substrate metallization. Journal of Materials Chemistry, 2008, 18 (26), pp.3084-3086. ⟨10.1039/b804460k⟩. ⟨hal-01567660⟩