Manufacturing and testing of a metal supported Ni-YSZ/YSZ/La2NiO4 IT-SOFC synthesized by physical surface deposition processes

Jérémie Fondard (1, 2, 3) , Pierre Bertrand (3) , Alain Billard (1, 2) , Sébastien Fourcade (4) , Pierre Batocchi (4) , Fabrice Mauvy (4) , Ghislaine Bertrand (5) , Pascal Briois (1, 2)

1 FC LAB - Laboratoire Commun de Belfort : Hydrogène et Pile à Combustible pour les applications au transport
2 FEMTO-ST - Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174)
3 ICB - Laboratoire Interdisciplinaire Carnot de Bourgogne
4 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux
5 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux

The manufacture of the last generation metal supported IT-SOFC complete cell by dry surface deposition processes is really challenging. Atmospheric Plasma Spraying (APS) and Reactive Magnetron Sputtering (RMS) processes are respectively adapted to deposit Ni-YSZ anode and YSZ electrolyte layers. RMS is also used to coat a thin and dense La2NiO4 (LNO) cathode layer. In this work, we have realized a complete cell on metallic support (ITM) produced by PLANSEE SE. The innovative LNO cathode layer was compared with screen-printed LNO layers, with and without RMS bonding layer. Electrochemical and Voltammetry tests were performed on these samples. It reveals lower performances than literature due to the high density of the RMS cathode layer, and too high temperature during sintering step which deteriorate layers manufactured by RMS and metallic substrate. Nevertheless, using LNO bonding layer manufactured by RMS seems to be an interesting way to improve the polarization resistance of the cell.

Mots clés: SOFC; Metal support cell; Thin films; Electrochemical measurement

Domaines: Matériaux; Matériaux

Jérémie Fondard, Pierre Bertrand, Alain Billard, Sébastien Fourcade, Pierre Batocchi, et al.. Manufacturing and testing of a metal supported Ni-YSZ/YSZ/La2NiO4 IT-SOFC synthesized by physical surface deposition processes. Solid State Ionics, 2017, 310, pp.10-23. ⟨10.1016/j.ssi.2017.07.027⟩. ⟨hal-01583770⟩