Electron beam lithography: resolution limits and applications, Applied surface science, pp.164-111, 2000. ,
DOI : 10.1016/s0169-4332(00)00352-4
Polyimide nanostructures fabricated by nanoimprint lithography and its applications, Microelectronic Engineering, vol.83, issue.4-9, pp.906-909, 2006. ,
DOI : 10.1016/j.mee.2006.01.014
URL : http://nparc.cisti-icist.nrc-cnrc.gc.ca/eng/view/accepted/?id=533d0967-a28d-44f3-aa16-466fe617ec69
Lithographic patterning of conducting polymers and their composites, Synthetic Metals, vol.41, issue.3, pp.1111-1114, 1991. ,
DOI : 10.1016/0379-6779(91)91564-Q
Development of a photopolymerisable membrane for calcium ion sensors, Analytica Chimica Acta, vol.426, issue.1, pp.3-10, 2001. ,
DOI : 10.1016/S0003-2670(00)01146-6
Development of a long-term stable organic membrane-based thin-film microsensor using new-type substrate surface treatment, Talanta, vol.71, issue.5, pp.1856-1860, 2007. ,
DOI : 10.1016/j.talanta.2006.08.033
Development of chemical field effect transistors for the detection of urea, Sensors and Actuators B: Chemical, vol.95, issue.1-3, pp.95-309, 2003. ,
DOI : 10.1016/S0925-4005(03)00430-1
Development of a creatinine-sensitive sensor for medical analysis, Sensors and Actuators, vol.103, pp.260-264, 2004. ,
Development of pNH4-ISFET microsensors for water analysis, Microelectronics Journal, vol.37, pp.475-479, 2006. ,
SU8 resist for low-cost X-ray patterning of high-resolution, high-aspect-ratio MEMS, Microelectronics Journal, vol.33, issue.1-2, pp.101-105, 2002. ,
DOI : 10.1016/S0026-2692(01)00109-4
SU-8 as a structural material for labs-on-chips and microelectromechanical systems, ELECTROPHORESIS, vol.17, issue.8, pp.4539-4551, 2007. ,
DOI : 10.1016/j.sna.2005.03.025
Processing of thin SU-8 films, Journal of Micromechanics and Microengineering, vol.18, issue.12, p.125020, 2008. ,
DOI : 10.1088/0960-1317/18/12/125020
A soft-imprint technique for submicron-scale patterns using a PDMS mold, Microelectronic Engineering, vol.73, issue.74, pp.73-74, 2004. ,
DOI : 10.1016/S0167-9317(04)00095-4
Fabrication of microfluidic devices based on glass???PDMS???glass technology, Microelectronic Engineering, vol.84, issue.5-8, pp.1265-1269, 2007. ,
DOI : 10.1016/j.mee.2007.01.276
pH-ChemFET-based analysis devices for the bacterial activity monitoring, Sensors and Actuators B: Chemical, vol.134, issue.1, pp.339-344, 2008. ,
DOI : 10.1016/j.snb.2008.04.029
A facile fabrication of semiconductor nanowires gas sensor using PDMS patterning and solution deposition, Sensors and Actuators B: Chemical, vol.136, issue.1, pp.224-229, 2009. ,
DOI : 10.1016/j.snb.2008.10.042
Plasma induced patterning of polydimethylsiloxane surfaces, Materials Science and Engineering: B, vol.156, issue.1-3, pp.18-23, 2009. ,
DOI : 10.1016/j.mseb.2008.10.036
Benzocyclobutene (DVS-BCB) polymer as an interlayer dielectric (ILD) material, Microelectronic Engineering, vol.33, issue.1-4, pp.33-327, 1997. ,
DOI : 10.1016/S0167-9317(96)00061-5
Selective wafer-level adhesive bonding with benzocyclobutene for fabrication of cavities, Sensors and Actuators A105, pp.297-304, 2003. ,
DOI : 10.1016/S0924-4247(03)00202-4
Biocompatible benzocyclobutene (BCB)-based neural implants with micro-fluidic channel, Biosensors and Bioelectronics, vol.20, issue.2, pp.404-407, 2004. ,
DOI : 10.1016/j.bios.2004.02.005
Embedded benzocyclobutene in silicon: An integrated fabrication process for electrical and thermal isolation in MEMS, Microelectronic Engineering, vol.82, issue.2, pp.154-167, 2005. ,
DOI : 10.1016/j.mee.2005.07.005
A novel packaging method using wafer-level BCB polymer bonding and glass wet-etching for RF applications, Sensors and Actuators A: Physical, vol.147, issue.2, pp.677-682, 2008. ,
DOI : 10.1016/j.sna.2008.06.008
Development of photo-polymerisable polyvinyl alcohol for biotechnological applications, Sensors and Actuators B: Chemical, vol.94, issue.3, pp.330-336, 2003. ,
DOI : 10.1016/S0925-4005(03)00463-5
NH4+-sensitive chemically modified field effect transistors based on siloxane membranes for flow-cell applications, Analytica Chimica Acta, vol.401, issue.1-2, pp.105-110, 1999. ,
DOI : 10.1016/S0003-2670(99)00492-4
Mass patterning of polysiloxane layers using spin coating and photolithography techniques, Microelectronics Journal, vol.37, issue.2, pp.133-136, 2006. ,
DOI : 10.1016/j.mejo.2005.04.054
Characteristics of resist films produced by spinning, Journal of Applied Physics, vol.21, issue.7, pp.3993-3997, 1978. ,
DOI : 10.1017/S0305004100012561