Soft mold NanoImprint Lithography: a versatile tool for sub-wavelength grating applications
Résumé
Due to its independency to the substrate used, Soft mold NanoImprint Lithography (S-NIL) is a technique of great interest
in particular for the fabrication of optical devices. We demonstrate a mature pathway for the fabrication of optical filters
from the conception to the optical characterization. Those filters can be fabricated on large surfaces (up to 600 diameter
wafers) with high conformity on various substrates. Quality of the transfer will be discussed throughout the process and
optical performances compared to those obtained with classical techniques. In this paper we fabricated tunable spectral
filters with a grating periodicity down to 260 nm and imprint surfaces up to 600. Physical conformity of the gratings will be
discussed in terms of long-range stitching obtained on 600 Si hard mold, dimensional shrinkage during thermal NanoImprint
on Zeonor(R) soft mold and conformity towards patterned hard mold throughout the process.