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LP-CVD Silicon-Based Film Formation in Submicrometer Trenches in Industrial Equipment: Experiments and Simulation

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https://hal.umontpellier.fr/hal-01726649
Contributor : Philippe Falque <>
Submitted on : Thursday, March 8, 2018 - 2:47:33 PM
Last modification on : Friday, January 10, 2020 - 9:08:45 PM

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H. Gris, B. Caussat, D. Cot, J. Durand, J.-P. Couderc. LP-CVD Silicon-Based Film Formation in Submicrometer Trenches in Industrial Equipment: Experiments and Simulation. Chemical Vapor Deposition, Wiley-VCH Verlag, 2002, 8 (5), pp.213 - 219. ⟨10.1002/1521-3862(20020903)8:5<213::AID-CVDE213>3.0.CO;2-8⟩. ⟨hal-01726649⟩

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