C ion-implanted TiO2 thin film for photocatalytic applications

G. Impellizzeri (1) , V. Scuderi (1) , L. Romano (1) , E. Napolitani (1) , R. Sanz (1) , Robert Carles (2) , V. Privitera (1)

1 MATIS - MATIS CNR-INFM Dipartimento di Metodologie Fisiche e Chimiche (DMFCI)
2 CEMES-NeO - Nano-Optique et Nanomatériaux pour l'optique

Third-generation TiO2 photocatalysts were prepared by implantation of C+ ions into 110nm thick TiO2 films. An accurate structural investigation was performed by Rutherford backscattering spectrometry, secondary ion mass spectrometry, X-ray diffraction, Raman-luminescence spectroscopy, and UV/VIS optical characterization. The C doping locally modified the TiO2 pure films, lowering the band-gap energy from 3.3eV to a value of 1.8eV, making the material sensitive to visible light. The synthesized materials are photocatalytically active in the degradation of organic compounds in water under both UV and visible light irradiation, without the help of any additional thermal treatment. These results increase the understanding of the C-doped titanium dioxide, helpful for future environmental applications.

Mots clés: Energy gap; Heavy ions; Ions; Light; Mass spectrometry; Photodegradation; Rutherford backscattering spectroscopy; Secondary ion mass spectrometry; Semiconductor doping; Spectrometry; X ray diffraction; Degradation of organic compounds; Environmental applications; Luminescence spectroscopy; Optical characterization; Photocatalytic application; Rutherford back-scattering spectrometry; Structural investigation; Synthesized materials; Titanium dioxide

Domaines: Physique [physics]

G. Impellizzeri, V. Scuderi, L. Romano, E. Napolitani, R. Sanz, et al.. C ion-implanted TiO2 thin film for photocatalytic applications. Journal of Applied Physics, 2015, 117 (10), pp.105308 - 173507. ⟨10.1063/1.4915111⟩. ⟨hal-01763598⟩