Structural investigations of Inductively Coupled Plasma ultra-thin silicon nanowires

Simona Boninelli (1) , Marta Agati (1) , Guillaume Amiard (2) , Vincent Paillard (3) , Paola Castrucci (4) , Richard Dolbec , My Ali El Khakani (5)

1 IMM - Istituto per la Microelettronica e Microsistemi [Catania]
2 PPrime [Poitiers] - Institut Pprime [UPR 3346]
3 CEMES-NeO - Nano-Optique et Nanomatériaux pour l'optique
4 Dipartimento di Fisica and Unità CNISM
5 Advanced Laser Light Source-INRS-EMT

We demonstrated the high throughput production of ultra-thin SiNWs by the innovative Inductively Coupled Plasma (ICP) approach. Our investigations revealed that the vast majority (∼95%) of the ICP produced SiNWs grew according to the Oxide Assisted Growth mechanism, and the 5% through the Vapor-Liquid-Solid mechanism. These SiNWs present an intriguing internal nanostructure, that provides a new kind of nanocomposite, where quantum confinement effects are expected. Indeed, an intense photoluminescence emission in the near infra-red was observed. These results prove the ICP as a genuinely bulk process, which can be exploited for large scale production of thin SiNWs to be integrated into attractive large-area and flexible optoelectronic devices.

Mots clés: Nanotechnology; Optoelectronic devices; Throughput; Inductively coupled plasma (ICP); Large scale productions; Oxide-assisted growths; Photoluminescence emission; Quantum confinement effects; Structural investigation; Ultrathin silicon; Vapor-liquid-solid mechanism; Inductively coupled plasma

Domaines: Physique [physics]

Simona Boninelli, Marta Agati, Guillaume Amiard, Vincent Paillard, Paola Castrucci, et al.. Structural investigations of Inductively Coupled Plasma ultra-thin silicon nanowires. Nanotechnology Materials and Devices Conference (NMDC), 2016 IEEE, 2016, Unknown, Unknown Region. ⟨10.1109/NMDC.2016.7777167⟩. ⟨hal-01765047⟩