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AZO electrodes deposited by atomic layer deposition for OLED fabrication

Abstract : In this work, we present a comparative study of optimized AZO electrodes deposited by Atomic Layer Deposition (ALD) with commercial ITO in terms of electrical, optical and structural properties. Despite a lower figure of merit mainly due to a higher sheet resistance, AZO-based OLEDs are shown to present a current density five times higher than ITO-based ones for the same applied voltage. These AZO electrodes fabricated by ALD could thus be promising substitutes for conventional ITO anodes in organic electronic devices.
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https://hal.laas.fr/hal-01993226
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Submitted on : Thursday, January 24, 2019 - 6:46:09 PM
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  • HAL Id : hal-01993226, version 1

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Benoit Dugrenil, Isabelle Séguy, H. Lee, Thierry Camps, Y.-C. Lin, et al.. AZO electrodes deposited by atomic layer deposition for OLED fabrication. SPIE Photonics Europe, Apr 2014, Brussels, Belgium. pp.91371D. ⟨hal-01993226⟩

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