A dedicated micromachining technology for high-aspect-ratio millimetre-wave circuits

Abstract : This paper presents a new technological process to implement efficient millimetre-wave passive circuits on a silicon substrate. This process associates a thick positive photoresist acting as a mould for the realization of thick conductors (several microns) with an ultra-thin dielectric membrane using only two layers (SiO2/Si2N3.8) in order to reduce both dielectric and ohmic losses in the coplanar millimetre-wave circuits. Coplanar transmission lines and a band-pass filter in the 30 GHz range, featuring respectively transmission losses lower than 0.2 and 1 dB, illustrate some potentialities of this process.
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https://hal.archives-ouvertes.fr/hal-02045991
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Submitted on : Friday, February 22, 2019 - 2:25:56 PM
Last modification on : Saturday, October 26, 2019 - 1:30:11 AM

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E. Saint-Etienne, Patrick Pons, G. Blasquez, Pierre Temple-Boyer, Véronique Conédéra, et al.. A dedicated micromachining technology for high-aspect-ratio millimetre-wave circuits. Sensors and Actuators A: Physical , Elsevier, 1998, 68 (1-3), pp.435-441. ⟨10.1016/S0924-4247(98)00073-9⟩. ⟨hal-02045991⟩

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