Organometallic Chemical Vapor Deposition of Palladium under Very Mild Conditions of Temperature in the Presence of a Low Reactive Gas Partial Pressure

Jean-Cyrille Hierso (1) , Christine Satto , Roselyne Feurer (2) , Philippe Kalck (1)

1 Laboratoire de Catalyse et Chimie Fine
2 Laboratoire de Chimie du Solide

Domaines: Chimie

Jean-Cyrille Hierso, Christine Satto, Roselyne Feurer, Philippe Kalck. Organometallic Chemical Vapor Deposition of Palladium under Very Mild Conditions of Temperature in the Presence of a Low Reactive Gas Partial Pressure. Chemistry of Materials, 1996, 8 (10), pp.2481-2485. ⟨10.1021/cm960106m⟩. ⟨hal-02162951⟩