Characterization of the Electrical Behaviour of Thin Dielectric Films at Nanoscale using Methods Derived from Atomic Force Microscopy: Application to Plasma Deposited AgNPs-Based Nanocomposites

Christina Villeneuve-Faure (1) , Kremena Makasheva (2) , C. Diaou (3) , Laurent Boudou (1) , G. Teyssedre (1)

1 LAPLACE-DSF - Diélectriques Solides et Fiabilité
2 LAPLACE-MPP - Matériaux et Procédés Plasmas
3 LAPLACE - LAboratoire PLasma et Conversion d'Energie

Recent advances in the development of micro-and nano-devices call for applications of thin nanocomposite dielectric films (thickness less than few tens of nanometers) with tuneable electrical properties. For optimization purposes, their behaviour under electrical stress needs to be probed at relevant scale, i.e. nanoscale. To that end electrical modes derived from Atomic Force Microscopy (AFM) appear the best methods due to their nanoscale resolution and non-destructive nature which permits in-situ characterization. The potentialities of electrical modes derived from AFM are presented in this work. The samples under study consist of plasma processed thin dielectric silica layers with embedded silver nanoparticles (AgNPs). Charge injection at local scale, performed by using AFM tip, is investigated by Kelvin Probe Force Microscopy (KPFM). Modulation of the local permittivity induced by the presence of AgNPs is assessed by Electrostatic Force Microscopy (EFM).

Mots clés: AgNPs; permittivity; AFM; KPFM; EFM; nanocomposite dielectrics; plasma processes; SiO 2

Domaines: Sciences de l'ingénieur [physics]

Christina Villeneuve-Faure, Kremena Makasheva, C. Diaou, Laurent Boudou, G. Teyssedre. Characterization of the Electrical Behaviour of Thin Dielectric Films at Nanoscale using Methods Derived from Atomic Force Microscopy: Application to Plasma Deposited AgNPs-Based Nanocomposites. 2018 IEEE 13th Nanotechnology Materials and Devices Conference (NMDC), Oct 2018, Portland, United States. pp.1-4, ⟨10.1109/NMDC.2018.8605887⟩. ⟨hal-02324336⟩