Effect of total pressure on La 2 NiO 4 coatings deposited by reactive magnetron sputtering using plasma emission monitoring

Jérémie Fondard (1, 2) , Alain Billard (1, 2) , Ghislaine Bertrand (3) , Sébastien Fourcade (4) , Pierre Batocchi (4) , Fabrice Mauvy (4) , Pascal Briois (1, 2)

1 IRTES - LERMPS - Laboratoire d'Études et de Recherches sur les Matériaux, les Procédés et les Surfaces
2 FCLAB - Fuel Cell LAB : Vers des Systèmes Pile à Combustible Efficients
3 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux
4 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux

This work focuses on the structural, microstructural, electrical and electrochemical characterization of La–Ni–O coatings deposited by reactive magnetron sputtering under different argon partial pressures. Deposition was driven by Plasma Emission Monitoring system (PEM) which allows high deposition rate. For each pressure, the optimal regulation setpoint for lanthanum oxide deposition is determined and then the current dissipated on the nickel target is adjusted to obtain the convenient La/Ni ratio to achieve the K2NiF4 structure. After an appropriate annealing treatment, coatings crystallize in the desired structure with more or less impurities. Increasing the device's pressure from 0.4 to 4.8Pa produces more porous samples with different microstructures. Then, a coating with porosity gradient was built by using these four different total pressures. Its electrical performances were tested and allowed its utilization as cathode layer in intermediate temperature-solid oxide fuel cell (IT-SOFC). This modified architecture cathode allows better performances (71mW·cm−2) than dense cathode produced by the same technique (51mW·cm−2).

Mots clés: La2NiO4; Reactive magnetron sputtering; Effect of total pressure; Intermediate-temperature solid oxide fuel cell; Complete cell tests

Domaines: Matériaux; Matériaux

Jérémie Fondard, Alain Billard, Ghislaine Bertrand, Sébastien Fourcade, Pierre Batocchi, et al.. Effect of total pressure on La 2 NiO 4 coatings deposited by reactive magnetron sputtering using plasma emission monitoring. Surface and Coatings Technology, 2016, 295, pp.29-36. ⟨10.1016/j.surfcoat.2015.11.053⟩. ⟨hal-02430400⟩