A simple method for measuring plasma power in rf-GDOES instruments

Thomas Nelis (1) , M. Aeberhard (1) , L. Rohr (1) , J. Michler (1) , Philippe Belenguer (2) , Philippe Guillot (3) , Laurent P. Thérèse (3)

1 EMPA - Swiss Federal Laboratories for Materials Science and Technology [Thun]
2 LAPLACE-GREPHE - Groupe de Recherche Energétique, Plasmas et Hors Equilibre
3 DPHE - Diagnostic des Plasmas Hors Equilibres

A method for determining plasma power in rf-GDOES is presented. It is based on an effective resistance located in the inductive coil of the impedance matching. The amount of electrical power consumed in the matching system depends on the capacitive current flowing through the matching system, which depends on the applied voltage, the stray capacity, and the frequency. This correction method is experimentally evaluated and compared with the integral plasma power calculation.

Mots clés: Blind power; rf-Power control; rf-GDOES

Domaines: Physique des plasmas [physics.plasm-ph]; Plasmas

Thomas Nelis, M. Aeberhard, L. Rohr, J. Michler, Philippe Belenguer, et al.. A simple method for measuring plasma power in rf-GDOES instruments. Analytical and Bioanalytical Chemistry, 2007, 389 (3), pp.763-767. ⟨10.1007/s00216-007-1509-3⟩. ⟨hal-02537428⟩