Nanoparticles growth in dusty plasmas from organosilicon precursor

Y Fermi , Salah Sahli , M. Kihel , S Mouissat , Patrice Raynaud (1)

1 LAPLACE-ScIPRA - Sciences et Ingénierie des Plasmas Réactifs et des Arcs

In this work, plasma discharge has been generated from pure HMDSO precursor in low frequency reactor. It has been observed that a cloud of Nanoparticles could be formed in a plasma discharge for some deposition parameters such as discharge power, time and pressure. Discharge signal analysis have been used in order to investigate the effect of deposition parameters on the nanoparticles growth. The study of discharge signal analysis shows that the pulse frequency is strongly related to plasma composition. Their value shifted from about 170 Hz to 250 Hz according to deposited parameters. This shift has been attributed to the nanoparticles formation in the plasma reactor. On the other hand, Nanoparticles embedded in thin films have been characterized by EDX and FTIR spectroscopy in order to reveal the NP’s composition.

Mots clés: growth mechanism; PECVD; Dust; Nanopowders

Domaines: Sciences de l'ingénieur [physics]

Y Fermi, Salah Sahli, M. Kihel, S Mouissat, Patrice Raynaud. Nanoparticles growth in dusty plasmas from organosilicon precursor. Fifth International Conference on Energy, Materials, Applied Energetics and Pollution. ICEMAEP 2019, Oct 2019, Constantine, Algeria. pp.1649. ⟨hal-03026860⟩