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hal-01921905v1  Journal articles
Z. EssaC. GaumerA. PakfarM. Gros-JeanM. Juhel et al.  Evaluation and modeling of lanthanum diffusion in TiN/La2O3/HfSiON/SiO2/Si high-k stacks
Applied Physics Letters, American Institute of Physics, 2012, 101 (18), pp.182901. ⟨10.1063/1.4764558⟩