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hal-01922894
v1
Journal articles
E. Bazizi
,
P Fazzini
,
A. Pakfar
,
C. Tavernier
,
B. Vandelle
et al.
Modeling of the effect of the buried Si–SiO2 interface on transient enhanced boron diffusion in silicon on insulator
Journal of Applied Physics
, American Institute of Physics, 2010, 107 (7), pp.074503.
⟨10.1063/1.3369160⟩
hal-01435138
v1
Journal articles
Zahi Essa
,
B. Pelletier
,
P. Morin
,
P. Boulenc
,
A. Pakfar
et al.
Modeling boron dose loss in sidewall spacer stacks of complementary metal oxide semiconductor transistors
Solid-State Electronics
, Elsevier, 2016, 126, pp.163-169.
⟨10.1016/j.sse.2016.08.002⟩
hal-01921905
v1
Journal articles
Z. Essa
,
C. Gaumer
,
A. Pakfar
,
M. Gros-Jean
,
M. Juhel
et al.
Evaluation and modeling of lanthanum diffusion in TiN/La2O3/HfSiON/SiO2/Si high-k stacks
Applied Physics Letters
, American Institute of Physics, 2012, 101 (18), pp.182901.
⟨10.1063/1.4764558⟩
hal-01633467
v1
Journal articles
Pier-Francesco Fazzini
,
Fuccio Cristiano
,
Etienne Talbot
,
Gérard Benassayag
,
S. Paul
et al.
Effect of Germanium content and strain on the formation of extended defects in ion implanted Silicon/Germanium
Thin Solid Films
, Elsevier, 2010, 518 (9), pp.2338 - 2341.
⟨10.1016/j.tsf.2009.09.172⟩
hal-01922678
v1
Journal articles
E. Bazizi
,
A. Pakfar
,
P Fazzini
,
Fuccio Cristiano
,
C. Tavernier
et al.
Transfer of physically-based models from process to device simulations: Application to advanced SOI MOSFETs
Thin Solid Films
, Elsevier, 2010, 518 (9), pp.2427 - 2430.
⟨10.1016/j.tsf.2009.09.141⟩
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