Université Toulouse III - Paul Sabatier

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	hal-02329202v1 Journal articles G.P. Gakis, H. Vergnes, E. Scheid, C. Vahlas, B. Caussat et al. Computational Fluid Dynamics simulation of the ALD of alumina from TMA and H2O in a commercial reactor Chemical Engineering Research and Design, Elsevier, 2018, 132, pp.795-811. ⟨10.1016/j.cherd.2018.02.031⟩
	hal-00531708v1 Journal articles E. Blanquet, A. Mantoux, Michel Pons, C. Vahlas. Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: Towards deposition of multimetallic films Journal of Alloys and Compounds, Elsevier, 2010, 504S, pp.422-424
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