Skip to Main content Skip to Navigation


...
hal-01745024v1  Journal articles
L. LamagnaC. WiemerM. PeregoS. N. VolkosS. Baldovino et al.  O-3-based atomic layer deposition of hexagonal La2O3 films on Si(100) and Ge(100) substrates
Journal of Applied Physics, American Institute of Physics, 2010, 108 (8), pp.084108. ⟨10.1063/1.3499258⟩