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hal-01508074v1
Journal articles
Formation of silicon nanocrystals by thermal annealing of low-pressure chemical-vapor deposited amorphous SiNx (x=0.16) thin films Materials Science in Semiconductor Processing, Elsevier, 2013, 16 (6), pp.1849-1852. ⟨10.1016/j.mssp.2013.07.019⟩ |
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