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hal-01745031v1  Journal articles
D. TsoutsouL. LamagnaS. N. VolkosA. MolleS. Baldovino et al.  Atomic layer deposition of LaxZr1-xO2-delta (x=0.25) high-k dielectrics for advanced gate stacks
Applied Physics Letters, American Institute of Physics, 2009, 94 (5), pp.53504 - 53504. ⟨10.1063/1.3075609⟩
hal-01745024v1  Journal articles
L. LamagnaC. WiemerM. PeregoS. N. VolkosS. Baldovino et al.  O-3-based atomic layer deposition of hexagonal La2O3 films on Si(100) and Ge(100) substrates
Journal of Applied Physics, American Institute of Physics, 2010, 108 (8), pp.084108. ⟨10.1063/1.3499258⟩