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	hal-02043421v1 Journal articles Ahmet Lale, Emmanuel Scheid, Fuccio Cristiano, Lucien Datas, Benjamin Reig et al. Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: investigation of interfacial and structural properties Thin Solid Films, Elsevier, 2018, 666, pp.20 - 27. ⟨10.1016/j.tsf.2018.09.028⟩
	hal-01511365v2 Journal articles Pierre Temple-Boyer, Bernard Rousset, Emmanuel Scheid. Influences of deposition and crystallization kinetics on the properties of silicon films deposited by low-pressure chemical vapour deposition from silane and disilane Thin Solid Films, Elsevier, 2010, 518 (23), pp.6897-6903. ⟨10.1016/j.tsf.2010.07.037⟩
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