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	hal-02043421v1 Journal articles Ahmet Lale, Emmanuel Scheid, Fuccio Cristiano, Lucien Datas, Benjamin Reig et al. Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: investigation of interfacial and structural properties Thin Solid Films, Elsevier, 2018, 666, pp.20 - 27. ⟨10.1016/j.tsf.2018.09.028⟩
	hal-01921377v1 Journal articles Cloud Nyamhere, A Scheinemann, A Schenk, A Scheit, François Olivie et al. A comprehensive study of the impact of dislocation loops on leakage currents in Si shallow junction devices Journal of Applied Physics, American Institute of Physics, 2015, 118, pp.184501. ⟨10.1063/1.4935293⟩
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