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	hal-01511365v2 Journal articles Pierre Temple-Boyer, Bernard Rousset, Emmanuel Scheid. Influences of deposition and crystallization kinetics on the properties of silicon films deposited by low-pressure chemical vapour deposition from silane and disilane Thin Solid Films, Elsevier, 2010, 518 (23), pp.6897-6903. ⟨10.1016/j.tsf.2010.07.037⟩
	hal-01922678v1 Journal articles E. Bazizi, A. Pakfar, P Fazzini, Fuccio Cristiano, C. Tavernier et al. Transfer of physically-based models from process to device simulations: Application to advanced SOI MOSFETs Thin Solid Films, Elsevier, 2010, 518 (9), pp.2427 - 2430. ⟨10.1016/j.tsf.2009.09.141⟩
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