|
||
---|---|---|
hal-01511365v2
Journal articles
Influences of deposition and crystallization kinetics on the properties of silicon films deposited by low-pressure chemical vapour deposition from silane and disilane Thin Solid Films, Elsevier, 2010, 518 (23), pp.6897-6903. ⟨10.1016/j.tsf.2010.07.037⟩ |
||
hal-01922678v1
Journal articles
Transfer of physically-based models from process to device simulations: Application to advanced SOI MOSFETs Thin Solid Films, Elsevier, 2010, 518 (9), pp.2427 - 2430. ⟨10.1016/j.tsf.2009.09.141⟩ |
||
|