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hal-03097892v1  Journal articles
Fouzi Addou, Thomas Duguet, Yohann Ledru, Didier Mesnier, Constantin Vahlas. Engineering Copper Adhesion on Poly-Epoxy Surfaces Allows One-Pot Metallization of Polymer Composite Telecommunication Waveguides
Coatings, MDPI, 2021, ⟨10.3390/coatings11010050⟩
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hal-02409432v1  Journal articles
Diane Samelor, Loïc Baggetto, Raphaël Laloo, Viviane Turq, Alain Gleizes et al.  Efficient, durable protection of the Ti6242S titanium alloy against high-temperature oxidation through MOCVD processed amorphous alumina coatings
Journal of Materials Science, Springer Verlag, 2020, 55 (11), pp.4883-4895. ⟨10.1007/s10853-019-04277-y⟩
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hal-02396259v1  Journal articles
Thomas Duguet, Eliane Amin-Chalhoub, Diane Samélor, Alessandro Pugliara, Constantin Vahlas. Black Co oxides coatings for thermosensitive polymer surfaces by low- temperature DLI-MOCVD
Surface and Coatings Technology, Elsevier, 2018, ⟨10.1016/j.surfcoat.2018.05.087⟩
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hal-02396273v1  Journal articles
George Psarellis, Ioannis Aviziotis, Thomas Duguet, Constantin Vahlas, Eleni Koronaki et al.  Investigation of reaction mechanisms in the chemical vapor deposition of al from DMEAA
Chemical Engineering Science, Elsevier, 2017, ⟨10.1016/j.ces.2017.12.006⟩
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hal-02396263v1  Conference papers
Diane Samelor, Loïc Baggetto, Raphaël Laloo, Viviane Turq, Thomas Duguet et al.  Amorphous Alumina Films Efficiently Protect Ti6242S against Oxidation and Allow Operation above 600 °C
THERMEC, Jul 2018, Paris, France. ⟨10.4028/www.scientific.net/MSF.941.1846⟩
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hal-02558375v1  Journal articles
Nathalie Prud'homme, Vassilios Constantoudis, Asiya Turgambaeva, Vladislav Krisyuk, Diane Samélor et al.  Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology
Thin Solid Films, Elsevier, 2020, ⟨10.1016/j.tsf.2020.137967⟩
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hal-02962225v1  Journal articles
Sebastian Beer, Annika Krusenbaum, Manuela Winter, Constantin Vahlas, Anjana Devi. ALD Precursors Study on Structural and Thermal Characteristics of Heteroleptic Yttrium Complexes as Potential Precursors for Vapor Phase Deposition
European Journal of Inorganic Chemistry, Wiley-VCH Verlag, 2020, ⟨10.1002/ejic.202000436⟩
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hal-02396275v1  Journal articles
Ioannis Aviziotis, Thomas Duguet, Khaled Soussi, Marc Heggen, Marie-Christine Lafont et al.  Chemical Vapor Deposition of Al 13 Fe 4 Highly Selective Catalytic Films for the Semi-Hydrogenation of Acetylene
physica status solidi (a), Wiley, 2017, 215 (2), pp.1700692. ⟨10.1002/pssa.201700692⟩
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hal-02329213v1  Journal articles
Adeline Miquelot, Myrto Despotopoulou, Constantin Vahlas, Christina Villeneuve, Nita Dragoe et al.  Morphological, structural, optical, and electrical study of nanostructured thin films: Charge transport mechanism of p-type Co3O4
Materials Chemistry and Physics, Elsevier, 2020, 240, pp.122059. ⟨10.1016/j.matchemphys.2019.122059⟩
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hal-02733187v1  Journal articles
Milad Mirabedin, Hugues Vergnes, Nicolas Caussé, Constantin Vahlas, Brigitte Caussat. An out of the box vision over oxidative chemical vapor deposition of PEDOT involving sublimed iron trichloride
Synthetic Metals, Elsevier, 2020, ⟨10.1016/j.synthmet.2020.116419⟩
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hal-02396236v1  Journal articles
Georgios Gakis, Hugues Vergnes, Fuccio Cristiano, Yann Tison, Constantin Vahlas et al.  Ιn situ N 2 -NH 3 plasma pre-treatment of silicon substrate enhances the initial growth and restricts the substrate oxidation during alumina ALD
Journal of Applied Physics, American Institute of Physics, 2019, 126 (12), pp.125305. ⟨10.1063/1.5113755⟩
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hal-02396270v1  Journal articles
Simon Ponton, Hugues Vergnes, Diane Samelor, Diane Samélor, Daniel Sadowski et al.  Development of a Kinetic Model for the Moderate Temperature Chemical Vapor Deposition of SiO 2 Films from Tetraethyl Orthosilicate and Oxygen
AIChE Journal, Wiley, 2018, ⟨10.1002/aic.16222⟩
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hal-02396239v1  Journal articles
Georgios Gakis, Constantin Vahlas, Hugues Vergnes, Sandrine Dourdain, Yann Tison et al.  Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al 2 O 3 on Si
Applied Surface Science, Elsevier, 2019, 492, pp.245 - 254. ⟨10.1016/j.apsusc.2019.06.215⟩
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hal-03086943v1  Journal articles
Konstantina Topka, Babacar Diallo, Diane Samelor, Raphael Laloo, Daniel Sadowski et al.  Tunable SiO2 to SiOxCyH films by ozone assisted chemical vapor deposition from tetraethylorthosilicate and hexamethyldisilazane mixtures
Surface and Coatings Technology, Elsevier, 2020, 407, ⟨10.1016/j.surfcoat.2020.126762⟩
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hal-02904363v1  Journal articles
Konstantina Topka, George Alexander Chliavoras, François Senocq, Hugues Vergnes, Diane Samelor et al.  Large temperature range model for the atmospheric pressure chemical vapor deposition of silicon dioxide films on thermosensitive substrates
Chemical Engineering Research and Design, Elsevier, 2020, 161, pp.146-158. ⟨10.1016/j.cherd.2020.07.007⟩

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