A comprehensive study of the impact of dislocation loops on leakage currents in Si shallow junction devices

Abstract : In this work, the electrical properties of dislo cation loops and their role in the generation of leakage currents in p-n or Schottky junctions were investigated both experimentally and through simulations. Deep Level Transient Spectroscopy (DLTS) reveals that the implantation of silicon with 2 10 15 Ge cm 2 and annealing between 1000  C and 1100  C introduced two broad elec- tron levels E C 0.38 eV and E C 0.29 eV in n-type samples and a single broad hole trap E V þ 0.25 eV in the p-type samples. These trap levels are related to the extended defects (dislocation loops) formed during annealing. Dislocation loo ps are responsible for the significant increase of leakage currents which are attributed to the sam e energy levels. The comparison between struc- tural defect parameters and electrical defect con centrations indicates that atoms located on the loop perimeter are the likely sources of the measured DLTS signals. The combined use of defect models and recently developed DLTS simulation allows reducing the number of assumptions and fitting parameters needed for the simulation of l eakage currents, therefore improving their pre- dictability. It is found that simulations based on t he coupled-defect-levels model reproduce well the measured leakage current values and their field dependence behaviour, indicating that leakage currents can be successfully simulated on the exc lusive basis of the experimentally observed energy levels
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Cloud Nyamhere, A Scheinemann, A Schenk, A Scheit, François Olivie, et al.. A comprehensive study of the impact of dislocation loops on leakage currents in Si shallow junction devices. Journal of Applied Physics, American Institute of Physics, 2015, 118, pp.184501. ⟨10.1063/1.4935293⟩. ⟨hal-01921377⟩

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